Epitaxially grown free-standing diamond platelet

Diamond and Related Materials

Volumn 10, Issue 12, 2001, Pages 2153-2156

  Suzuki, Kazuhiro ^a   Fukuda, Hideo ^b   Yamada, Takatoshi ^b   Sawabe, Atsuhito ^b  

^a Toplas Engineering Co Ltd   (Japan)

^b AOYAMA GAKUIN UNIVERSITY   (Japan)

Author keywords

d.c. Plasma CVD; Diamond; Free standing; Hetero epitaxy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; EPITAXIAL GROWTH; IRIDIUM; PLASMA APPLICATIONS; RAMAN SPECTROSCOPY; SINGLE CRYSTALS;

PLATELETS;

DIAMONDS;

DIAMOND;

EID: 0035577529     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(01)00497-6     Document Type: Article

References (9)