Low temperature growth of poly-crystalline film of silicon-rich silicon-germanium by reactive thermal chemical vapor deposition

Materials Research Society Symposium - Proceedings

Volumn 638, Issue , 2001, Pages

  Shimizu, Kousaku ^a   Zhang, Jianjun ^a   Lee, Jeong Woo ^a   Hanna, Jun Ichi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; GASES; HELIUM; POLYCRYSTALLINE MATERIALS; REDOX REACTIONS; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

POLYCRYSTALLINE FILMS;

POLYSILICON;

EID: 0035560254     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)