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Volumn 671, Issue , 2001, Pages
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A contact-mechanics based model for dishing and erosion in chemical-mechanical polishing
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Author keywords
[No Author keywords available]
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Indexed keywords
ALGORITHMS;
CONTACTS (FLUID MECHANICS);
EROSION;
MATHEMATICAL MODELS;
OPTIMIZATION;
PRESSURE DISTRIBUTION;
PRESSURE EFFECTS;
PROCESS CONTROL;
SURFACE ROUGHNESS;
DISHING;
METAL DAMASCENE;
PATTERN DENSITY;
PLANARIZATION;
PROCESS PARAMETERS;
SHALLOW TRENCH ISOLATION;
CHEMICAL MECHANICAL POLISHING;
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EID: 0035558036
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-671-m4.6 Document Type: Conference Paper |
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Times cited : (14)
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References (11)
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