SCOPUS 정보 검색 플랫폼

Materials Research Society Symposium - Proceedings

Volumn 669, Issue , 2001, Pages J5111-J5115

Defect evolution from low energy, amorphizing, germanium implants on silicon

(3) Gutierrez, Andres F a Jones, Kevin S a Downey, Daniel F a

a INTEL CORPORATION (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; CRYSTAL DEFECTS; CRYSTAL GROWTH; CRYSTALLINE MATERIALS; ELLIPSOMETRY; ION IMPLANTATION; RAPID THERMAL ANNEALING; TRANSMISSION ELECTRON MICROSCOPY;

ENERGY DROPS;

SILICON WAFERS;

EID: 0035557184 PISSN: 02729172 EISSN: None Source Type: Journal
DOI: 10.1557/proc-669-j5.11 Document Type: Article

Times cited : (2)

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