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Volumn 669, Issue , 2001, Pages
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Accurate modeling of residual recoil-mixing during SIMS measurements
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Author keywords
[No Author keywords available]
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Indexed keywords
ALGORITHMS;
ERROR ANALYSIS;
ION BEAMS;
MASS TRANSFER;
MIXING;
PROFILOMETRY;
SECONDARY ION MASS SPECTROMETRY;
SEMICONDUCTOR DOPING;
SEMICONDUCTOR JUNCTIONS;
DOPANT DISTRIBUTIONS;
ION BEAM INDUCED MASS TRANSPORT;
NANOSTRUCTURED MATERIALS;
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EID: 0035556471
PISSN: 02729172
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1557/proc-669-j4.16 Document Type: Conference Paper |
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Times cited : (1)
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References (7)
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