Advanced ion implantation technology for high performance transistors

Materials Research Society Symposium - Proceedings

Volumn 669, Issue , 2001, Pages

  Suguro, Kyoichi ^a   Murakoshi, Atsushi ^a   Iinuma, Toshihiko ^a   Akutsu, Haruko ^a   Shibata, Takeshi ^a   Sugihara, Yoshikazu ^a   Okumura, Katsuya ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL IMPURITIES; DISLOCATIONS (CRYSTALS); ELASTIC MODULI; ION IMPLANTATION; LEAKAGE CURRENTS; PHOTORESISTS; RAPID THERMAL ANNEALING; SEMICONDUCTING SILICON; SEMICONDUCTOR DOPING;

HIGH PERFORMANCE TRANSISTORS;

MOSFET DEVICES;

EID: 0035556420     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-669-j1.3     Document Type: Conference Paper

References (7)