Stencil mask ion implantation technology for high performance MOSFETs

Technical Digest - International Electron Devices Meeting

Volumn , Issue , 2000, Pages 869-871

  Shibata, T ^a   Suguro, K ^a   Sugihara, K ^a   Mizuno, H ^a   Yagishita, A ^a   Saito, T ^a   Okumura, K ^a   Nishihashi, T ^b   Gotou, T ^c   Tsunoda, M ^c   Saji, S ^c  

^a TOSHIBA CORPORATION   (Japan)

^b ULVAC INC   (Japan)

^c NSK LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIELECTRIC FILMS; ELECTRIC CONDUCTIVITY; MASKS; MOSFET DEVICES; PHOTORESISTS; POLYSILICON; SUBSTRATES; THRESHOLD VOLTAGE;

STENCIL MASK IMPLANTATION;

ION IMPLANTATION;

EID: 0034447699     PISSN: 01631918     EISSN: None     Source Type: Journal    
DOI: 10.1109/IEDM.2000.904456     Document Type: Article

References (0)