Analysis of dielectric breakdown of SiO2 film induced by copper ion drift

Advanced Metallization Conference (AMC)

Volumn , Issue , 2001, Pages 521-526

  Nishino, Hirotaka ^a   Fukuda, Takuya ^a   Yanazawa, Hiroshi ^a   Matsunaga, Hironori ^a  

^a ASSOCIATION OF SUPER ADVANCED ELECTRONICS TECHNOLOGIES ASET   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; CAPACITORS; COPPER; CURRENT VOLTAGE CHARACTERISTICS; DIELECTRIC PROPERTIES; ELECTRON TRAPS; INTERFACES (MATERIALS); LEAKAGE CURRENTS; SECONDARY ION MASS SPECTROMETRY; SILICA;

DIELECTRIC BREAKDOWN;

SEMICONDUCTING FILMS;

EID: 0035555432     PISSN: 10480854     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)