Electrical conduction in silicon nitrides deposited by plasma enhanced chemical vapour deposition

Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties

Volumn 73, Issue 4, 1996, Pages 723-736

  Tao, Meng ^a   Park, Daegypu ^a   Mohammad, S Noor ^a   Li, Ding ^a   Botchkerav, Andrei E ^a   Morkoç, Hadis ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 7244262119     PISSN: 13642812     EISSN: None     Source Type: Journal    
DOI: 10.1080/13642819608239148     Document Type: Article

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