TEM and EELS microanalysis of pc-Si thin film solar cells deposited by means of HW CVD

Solar Energy Materials and Solar Cells

Volumn 70, Issue 1, 2001, Pages 39-47

  Stoger M ^a   Schattschneider, P ^a   Schlosser, V ^b   Schneider, R ^c   Kirmse, H ^c   Neumann, W ^c  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^b UNIVERSITY OF VIENNA   (Austria)

^c HUMBOLDT UNIVERSITY   (Germany)

Author keywords

Electron energy loss spectroscopy; Thin film; Transmission electron microscopy

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPOSITION EFFECTS; ELECTRON ENERGY LOSS SPECTROSCOPY; FILM GROWTH; GRAIN BOUNDARIES; MICROANALYSIS; POLYSILICON; SEMICONDUCTOR DOPING; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; ZINC OXIDE;

HOT WIRE CHEMICAL VAPOR DEPOSITION (HWCVD);

SILICON SOLAR CELLS;

EID: 0035546671     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(00)00410-4     Document Type: Article

References (8)