Parameter extraction for 193 nm chemically amplified resist from refractive index change

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2077-2081

  Sohn, Young Soo ^a   Oh, Hye Keun ^a   An, Ilsin ^a  

^a Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; EXTRACTION; LITHOGRAPHY; PROBES; REFRACTIVE INDEX; THICKNESS MEASUREMENT;

AMPLIFIED DEPROTECTION REACTION; CHEMICALLY AMPLIFIED RESISTS; POSTEXPOSURE BAKE; TRANSMITTANCE;

PHOTORESISTS;

EID: 0035519195     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1414016     Document Type: Article

References (6)

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5. P. J. Paniez, A. Vareille, P. Ballet, and B. Mortini, Proc. SPIE 3333, 289 (1998).
6. A. Erdmann, C. L. Henderson, C. G. Wilson, and W. Henke, Proc. SPIE 3051, 5291 (1997).