Surface wave plasma production employing high-permittivity material for microwave window

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 40, Issue 11 A, 2001, Pages

  Kusaba, Kouta ^a,c   Shinagawa, Keisuke ^b   Furukawa, Masakazu ^b   Kawamura, Katsufumi ^b   Shindo, Haruo ^a  

^a TOKAI UNIVERSITY   (Japan)

^b CANON INC   (Japan)

^c Nihon Kousyuha Co Ltd   (Japan)

Author keywords

High density plasma; Large diameter plasma; Oxygen plasma for ULSI processes; Permittivity of dielectric window; Surface wave plasma

Indexed keywords

DIELECTRIC MATERIALS; PERMITTIVITY; PLASMA DENSITY; PLASMAS; ULSI CIRCUITS;

DIELECTRIC WINDOW MATERIAL; LARGE-DIAMETER PLASMA; MICROWAVE POWER CONSUMPTION; PERMITTIVITY OF DIELECTRIC WINDOW; SURFACE WAVE PLASMA;

SURFACE WAVES;

EID: 0035517480     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.l1179     Document Type: Letter

References (8)