Characterization of systematic MOSFET current factor mismatch caused by metal CMP dummy structures

IEEE Transactions on Semiconductor Manufacturing

Volumn 14, Issue 4, 2001, Pages 302-310

  Tuinhout, Hans P ^b   Vertregt, Maarten ^a,b  

^a IEEE

^b PHILIPS RESEARCH LABORATORIES   (Netherlands)

Author keywords

Microelectronic test structure; MOSFET measurement method; Systematic parametric mismatch

Indexed keywords

CALCULATIONS; CAPACITANCE; CHEMICAL MECHANICAL POLISHING; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC CURRENT MEASUREMENT; GATES (TRANSISTOR); SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS; SEMICONDUCTOR DEVICE STRUCTURES; STATISTICAL METHODS; STRAIN; TRANSCONDUCTANCE;

MICROELECTRONIC TEST STRUCTURE; MOSFET CURRENT FACTOR MISMATCH; MOSFET TRANSCONDUCTANCE MISMATCH;

MOSFET DEVICES;

EID: 0035507409     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.964317     Document Type: Article

References (12)

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