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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 9 A, 2001, Pages 5399-5406

Comparison between static and dynamic simulations of ion reflection and sputtering from layered materials

(2) Kawakami, R a Ohya, K a

a UNIVERSITY OF TOKUSHIMA (Japan)

Author keywords

Dynamic simulation; Layered material; Reflection; Sputtering; Static simulation

Indexed keywords

CARBON; DEPOSITION; EROSION; ION BOMBARDMENT; SPUTTERING; TUNGSTEN;

ION REFLECTION; RECOIL IMPLANTATION; STATIC SIMULATION;

COMPUTER SIMULATION;

EID: 0035456743 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.40.5399 Document Type: Article

Times cited : (6)

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