Thin film poly-Si formation for solar cells by Flux method and Cat-CVD method

Solar Energy Materials and Solar Cells

Volumn 69, Issue 2, 2001, Pages 107-114

  Niira, K ^a   Hakuma, H ^a   Komoda, M ^a   Fukui, K ^a   Shirasawa, K ^a  

^a KYOCERA CORPORATION   (Japan)

Author keywords

Cat CVD method; Flux method; Poly Si film

Indexed keywords

CARRIER CONCENTRATION; FILM PREPARATION; GLASS; PHOTOSENSITIVITY; POLYSILICON; SEMICONDUCTING SILICON COMPOUNDS; SUBSTRATES; THIN FILM DEVICES;

FLUX METHOD;

SILICON SOLAR CELLS;

EID: 0035452880     PISSN: 09270248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0927-0248(00)00383-4     Document Type: Article

References (7)