A new '2D to 3D' X-ray lithography technology for gray scale structures

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 819-823

  Kudryashov, V A ^a   Lee, S ^a  

^a INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

Author keywords

3D structures; AZPN114; Gray scale structures; UVIII; X ray lithography

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; HIGH TEMPERATURE EFFECTS; MICROELECTRONICS;

GRAY SCALE STRUCTURES;

X RAY LITHOGRAPHY;

EID: 0035450889     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00559-7     Document Type: Article

References (5)

1. Free 3D shaping with grey-tone lithography and multidose e-beam writing
2. Coding gray-tone mask for refractive microlens fabrication
3. 3D microstructures fabricated by partially opaque X-ray lithography masks
4. Low voltage e-beam irradiation: A new tool for suppression of airborne contamination effects in positive chemically amplified resists
5. A new e-beam method for gray scale 3D optical elements