Low voltage e-beam irradiation: A new tool for suppression of airborne contamination effects in positive chemically amplified resists

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 203-206

  Kudryashov, V A ^a   Prewett, P D ^b   Michette, A G ^c  

^a INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

^c KING'S COLLEGE LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; ELECTRON BEAMS; IRRADIATION; TECHNOLOGY;

POSITIVE CHEMICALLY AMPLIFIED RESISTS;

MICROELECTRONICS;

EID: 0031685830     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00046-X     Document Type: Article

References (4)

1. G.Czech, et al, Microelectronic Engineering 23 (1994) pp. 331-335.
2. Hiroshi Ban, et al., J. of Photopolymer Science and Technol., vol 8, 1 (1994) pp. 17-22.
3. Takeshi Fujino, et al., J.Vac. Sci. Technol. B11, 6, (1993) pp. 2773-2777.
4. V.A.Kudryashov, et al., Microelectronic Eng. 35 (1997) pp.487-490.