Stress analysis in Si membranes for open stencil masks and mini-reticles using double bulging and resonance methods

Microelectronic Engineering

Volumn 57-58, Issue , 2001, Pages 425-432

  Degen, A ^a   Abedinov, N ^a   Gotszalk, T ^b   Sossna, E ^a   Kratzenberg, M ^a   Rangelow, I W ^a  

^a UNIVERSITY OF KASSEL   (Germany)

^b WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Double bulging; Resonance; Si membranes; Stress analysis

Indexed keywords

DIFFRACTION; NATURAL FREQUENCIES; SILICON; STRESS ANALYSIS;

OPEN STENCIL MASKS;

MASKS;

EID: 0035450093     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(01)00538-X     Document Type: Article

References (13)