Influence of electron flux on the oxidation of Ni3Al surfaces

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2581-2585

  Palasantzas, G ^a   Van Agterveld, D T L ^a   Koch, S A ^a   De Hosson, J Th M ^a  

^a UNIVERSITY OF GRONINGEN   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHEMISORPTION; ELECTRON BEAMS; NICKEL COMPOUNDS; NUCLEATION; OXIDATION; SCANNING ELECTRON MICROSCOPY;

ELECTRON FLUX;

POLYCRYSTALLINE MATERIALS;

EID: 0035443979     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1395620     Document Type: Article

References (18)