In situ x-ray photoelectron spectroscopy for thin film synthesis monitoring

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2127-2133

  Kelly, M A ^a   Shek, M L ^a   Pianetta, P ^a   Gur T M ^a   Beasley, M R ^a  

^a STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; SPUTTER DEPOSITION; SUBSTRATES; SYNTHESIS (CHEMICAL); X RAY PHOTOELECTRON SPECTROSCOPY; X RAY SPECTROMETERS;

LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD);

THIN FILMS;

EID: 0035439970     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1374618     Document Type: Article

References (10)