Gas-Sensing Properties of Nanocrystalline WO3 Films Made by Advanced Reactive Gas Deposition

Journal of the American Ceramic Society

Volumn 84, Issue 7, 2001, Pages 1504-1508

  Solis, Jose L ^a,c   Hoel, Anders ^a   Kish, Laszlo B ^a   Granqvist, Claes G ^a   Saukko, Sami ^b   Lantto, Vilho ^b  

^a UPPSALA UNIVERSITY   (Sweden)

^b UNIVERSITY OF OULU   (Finland)

^c UNIVERSIDAD NACIONAL DE INGENIERÍA   (Peru)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; CHEMICAL ACTIVATION; CHEMICAL SENSORS; CRYSTAL STRUCTURE; DEPOSITION; ELECTRON MICROSCOPY; FILMS; GRAIN SIZE AND SHAPE; NANOSTRUCTURED MATERIALS; SINTERING; SUBSTRATES; X RAY DIFFRACTION ANALYSIS;

GAS SENSING PROPERTIES; NANOCRYSTALLINE FILMS; REACTIVE GAS DEPOSITION;

TUNGSTEN COMPOUNDS;

EID: 0035413178     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2001.tb00868.x     Document Type: Article

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