Crystal structure comparison between conductive SrRuO3 and CaRuO3 thin films

Journal of Crystal Growth

Volumn 229, Issue 1, 2001, Pages 450-456

  Higashi, N ^a   Watanabe, T ^a   Saito, K ^b   Yamaji, I ^b   Akai, T ^b   Funakubo, H ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

^b PHILIPS RESEARCH LABORATORIES   (Germany)

Author keywords

A1. Crystal structure; A2. Growth from vapor; A3. Chemical vapor deposition processes; B1. Oxides; B3. Field effect transistors

Indexed keywords

CALCIUM COMPOUNDS; EPITAXIAL GROWTH; FIELD EFFECT TRANSISTORS; LANTHANUM COMPOUNDS; LATTICE CONSTANTS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; STRAIN; STRONTIUM COMPOUNDS; THIN FILMS;

CALCIUM RUTHENIUM OXIDE; HIGH RESOLUTION X RAY RECIPROCAL SPACE MAPPING; LATTICE MISMATCH; STRONTIUM RUTHENIUM OXIDE;

CONDUCTIVE FILMS;

EID: 0035399428     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)01201-5     Document Type: Article

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