SCOPUS 정보 검색 플랫폼

Journal of Micromechanics and Microengineering

Volumn 11, Issue 4, 2001, Pages 409-415

A Monte Carlo study of etching in the presence of a mask junction

(7) Van Veenendaal, E a Cuppen, H M a Van Enckevort, W J P a Van Suchtelen, J a,b Nijdam, A J b Elwenspoek, M b Vlieg, E a

a RADBOUD UNIVERSITY NIJMEGEN (Netherlands)

b UNIVERSITY OF TWENTE (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ACTUATORS; ANISOTROPY; COMPUTER SIMULATION; CONTACT ANGLE; CRYSTAL ORIENTATION; ETCHING; FABRICATION; INTERFACES (MATERIALS); MASKS; MONTE CARLO METHODS; NUCLEATION; SEMICONDUCTING SILICON; SENSORS;

MASK JUNCTIONS; WET CHEMICAL ETCHING;

SEMICONDUCTOR JUNCTIONS;

EID: 0035395462 PISSN: 09601317 EISSN: None Source Type: Journal
DOI: 10.1088/0960-1317/11/4/322 Document Type: Article

Times cited : (9)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.