SIMOX SOI surface smoothing for gate oxide integrity and reliability

IEEE International SOI Conference

Volumn , Issue , 1999, Pages 116-118

  Allen, L P ^a   Fenner, D B ^a   Skinner, W J ^a   Chandonnet, R ^a   Deziel, S E ^a   Torti, R P ^a   Toyoda, N ^a  

^a Epion Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ION BEAMS; SURFACE ROUGHNESS;

GAS CLUSTER ION BEAM (GCIB);

SILICON ON INSULATOR TECHNOLOGY;

EID: 0033314056     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (6)