A comparative study of position-sensitive detectors based on Schottky barrier crystalline and amorphous silicon structures

Journal of Materials Science: Materials in Electronics

Volumn 12, Issue 7, 2001, Pages 387-393

  Henry, J ^a   Livingstone, J ^a  

^a UNIVERSITY OF WESTERN AUSTRALIA   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CRYSTALLINE MATERIALS; DETECTORS; FABRICATION; LASER PULSES; OPTICAL SENSORS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCHOTTKY BARRIER DIODES;

SCHOTTKY BARRIER CRYSTALLINE STRUCTURES;

THIN FILM DEVICES;

EID: 0035389503     PISSN: 09574522     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1011230630886     Document Type: Article

References (10)