Structural and magnetic properties of high saturation induction CoNiFe electroplated films

IEEE Transactions on Magnetics

Volumn 37, Issue 4 I, 2001, Pages 1767-1769

  Ohshima, N ^a   Saito, M ^a   Ohashi, K ^a   Yamamoto, H ^a   Mibu, K ^b  

^a NEC CORPORATION   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

Band calculation; Electroplating; High Bs material; Magnetization; M ssbauer effect; Soft magnetic material

Indexed keywords

COBALT ALLOYS; CURRENT DENSITY; ELECTROPLATING; MAGNETIC MOMENTS; MAGNETIZATION; MICROSTRUCTURE; SOFT MAGNETIC MATERIALS; THERMAL EFFECTS;

ELECTROPLATED FILMS;

MAGNETIC THIN FILMS;

EID: 0035386755     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.950962     Document Type: Article

References (6)

1. Newly developed induction head with electro-plated CoNiFe film
2. Write performance of heads with a 2.1-Tesla CoNiFe pole
3. A soft magnetic CoNiFe film with high saturation magnetic flux density and low coercivity
4. s CoNiFe films
5. Accurate and simple density functional for the electronic exchange energy: Generalized gradient approximation