Analysis of focused ion beam implantation of semiconductors by thermal microscopy

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 429-436

  Dietzel, D ^a   Rocken H ^a   Pelzl, J ^a   Bein, B K ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Charge carrier waves; Ion implantation; Modulated optical reflectance; Silicon; Thermal microscopy; Thermal waves

Indexed keywords

CHARGED PARTICLES; ELECTRON TRANSPORT PROPERTIES; ION BEAMS; THERMOANALYSIS;

OPTICAL REFLECTANCE; THERMAL MICROSCOPY;

ION IMPLANTATION;

ION IMPLANTATION;

EID: 0035386663     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01253-1     Document Type: Article

References (8)

1. Combined electrical and optical heating in thermal wave microscopy of semiconductor devices