Plasma etching and ion implantation on silicon, characterized by laser-modulated optical reflectance

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 410-418

  Kiepert, W ^a   Obramski, H J ^a   Bolte, J ^a   Brandt, K ^b   Dietzel, D ^c   Niebisch, F ^a   Bein, B K ^a  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b Dynamitron Tandem Laboratory   (Germany)

^c D 44780   (Germany)

Author keywords

Charge carrier waves; Ion implantation; Modulated optical reflectance; Plasma etching; Semiconductor; Silicon; Thermal waves; Thermoreflectance

Indexed keywords

CHARGE CARRIERS; ELECTRONIC PROPERTIES; ION IMPLANTATION; LIGHT REFLECTION; PLASMA ETCHING; SEMICONDUCTING SILICON; THERMODYNAMIC PROPERTIES;

LASER-MODULATED OPTICAL REFLECTANCE; THERMAL WAVES;

SEMICONDUCTING FILMS;

EID: 0033354772     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00309-6     Document Type: Article

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