Properties of tetrahedral amorphous carbon film by filtered cathodic arc deposition for disk overcoat

IEEE Transactions on Magnetics

Volumn 37, Issue 4 I, 2001, Pages 1789-1791

  Hyodo, H ^a   Yamamoto, T ^a   Toyoguchi, T ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Disk overcoat; Filtered cathodic arc (FCA) deposition; Tetrahedral amorphous carbon (ta C) film

Indexed keywords

ADHESION; CARBON; DEPOSITION; DOPING (ADDITIVES); DURABILITY; HARDNESS; MAGNETIC DISK STORAGE; NITROGEN; PROTECTIVE COATINGS;

CARBON FILMS; DISK OVERCOAT; FILTERED CATHODIC ARC DEPOSITION;

AMORPHOUS FILMS;

EID: 0035386613     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.950969     Document Type: Article

References (8)

1. The deposition of thin films by filtered arc evaporation
2. EELS analysis of vacuum arc-deposited diamond-like films
3. Properties of carbon ion deposited tetrahedral amorphous carbon films as a function of ion energy
4. Ultra-thin overcoats for the head/disk interface tribology
5. Raman spectroscopy of carbon overcoats for magnetic disks
6. Raman spectrum of graphite
7. Material and tribological properties of a-C:H film by plasma CVD for a disk overcoat
8. Ultrathin amorphous C:H overcoats by pCVD on thin film media