Grain size reduction by utilizing a very thin CrW seedlayer and dry-etching process in CoCrTaNiPt longitudinal media

Journal of Applied Physics

Volumn 87, Issue 9, 2000, Pages 6860-6862

  Yoshimura, Satoru ^a   Djayaprawira, D D ^a   Kong, Tham Kim ^a   Masuda, Yusuke ^a   Shoji, Hiroki ^a   Takahashi, Migaku ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001758165     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372866     Document Type: Article

References (4)

1. A. Kikuchi, J. Nakai, S. Kawakita, H. Mitsuya, T. Shimatsu, and M. Takahashi, 19th Annual Conf. Magn. Soc. Japan. 409 1995, p. 409 (in Japanese).
2. J. Li, M. Mirzamaani, X. Bian, M. Doerner, T. Arnoldussen, S. Duan, and K. Tang, 43rd Annual Conf. Magn. Magn. Mater. 1998, p. AB-01.
3. B. Lu, D. E. Laughlin, D. N. Lambeth, S. Z. Wu, R. Ranjan, and G. C. Rauch, 43rd Annual Conf. Magn. Magn. Mater. 1998, p. AB-03.
4. R. Street and J. C. Wooley, Proc. Phys. Scc., London, Sect. A 62 562 (1949).