SCOPUS 정보 검색 플랫폼

Volumn 16, Issue 6, 2001, Pages 1541-1548

Relationship between the microstructure and nanoindentation hardness of thermally evaporated and magnetron-sputtered electrochromic tungsten oxide films

(5) Ong, C W a Wong, H Y a Pang, G K H a Baba Kishi, K Z a Choy, C L a

a HONG KONG POLYTECHNIC UNIVERSITY (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; CRYSTALLIZATION; DENSIFICATION; ELASTIC MODULI; EVAPORATION; GRAIN SIZE AND SHAPE; HIGH TEMPERATURE EFFECTS; INDENTATION; MAGNETRON SPUTTERING; MICROHARDNESS; OXYGEN; POLYCRYSTALLINE MATERIALS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

REACTIVE THERMAL EVAPORATION (RTE);

TUNGSTEN COMPOUNDS;

EID: 0035382261 PISSN: 08842914 EISSN: None Source Type: Journal
DOI: 10.1557/JMR.2001.0214 Document Type: Article

Times cited : (11)

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