STM lithography in an organic self-assembled monolayer

Advanced Functional Materials

Volumn 11, Issue 3, 2001, Pages 208-212

  Kleineberg, Ulf ^a   Brechling, Armin ^a   Sundermann, Michael ^a   Heinzmann, Ulrich ^a  

^a BIELEFELD UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTRON BEAM LITHOGRAPHY; ETCHING; SCANNING ELECTRON MICROSCOPY; SCANNING TUNNELING MICROSCOPY; SELF ASSEMBLY; SINGLE CRYSTALS; SURFACES;

BIPHENYLTHIOL; HEXADECANETHIOL; OCTADECYLTRICHLOROSILANE; SELF ASSEMBLED MONOLAYERS; TUNNELLING PARAMETERS;

MONOLAYERS;

EID: 0035382070     PISSN: 1616301X     EISSN: None     Source Type: Journal    
DOI: 10.1002/1616-3028(200106)11:3<208::AID-ADFM208>3.0.CO;2-X     Document Type: Article

References (2)

1. L. R. Harriott, J. Vac. Sci. Tcchnol. B 1997, 15, 2130.
2. R. M. Crooks, L. Sun, Langmuir 1993, 9, 1951.