Technique of depositing ITO films on glass substrate by high intensity pulsed ion beams method

Kuei Suan Jen Hsueh Pao/ Journal of the Chinese Ceramic Society

Volumn 29, Issue 3, 2001, Pages 249-253

  Wang, Chengyu ^a   Liu, Yongxing ^a   Ma, Tengcai ^a   Xia, Yuanliang ^a  

^a DALIAN POLYTECHNIC UNIVERSITY   (China)

Author keywords

Atomic force microscopy; High intensity pulsed ion beam; Plasma; Tin doped indium oxide film

Indexed keywords

ATOMIC FORCE MICROSCOPY; GLASS; INDIUM PLATING; ION BEAM ASSISTED DEPOSITION; PLASMA DENSITY; TIN DEPOSITS;

GLASS SUBSTRATE; HIGH INTENSITY PULSED ION BEAM; TIN DOPED INDIUM OXIDE FILM;

THIN FILMS;

EID: 0035381706     PISSN: 04545648     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (12)

1. High intensity pulsed ion beam sources and their industrial applications
2. Quick deposition of ZnS:Mn electroluminescent thin films by intense pulsed ion beam evaporation
3. Film deposition and surface modification using intense pulse ion beams
4. Preparation of thin films and nanosize powders by intense pulsed ion beam evaporation
5. Characteristic of ablation plasma produced by intense pulsed ion beam
6. Ablation plasma temperature produced by intense pulsed ion-beam evaporation
7. Semiconducting transparent thin films - Their properties and applications
8. Dynamics of laser-induced vaporization for ultrafast deposition of amorphous silicon films
9. Anisotropic tribological properties of the coating on a magnetic recording disk