Interface-engineered Josephson junctions optimized for high J C

IEEE Transactions on Applied Superconductivity

Volumn 11, Issue 2, 2001, Pages 4032-4035

  Shimakage, Hisashi ^b   Ono, Ronald H ^a,c   Vale, Leila R ^c   Wang, Zhen ^b  

^a IEEE   (United States)

^b Kansai Advanced Research Center   (Japan)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Interface engineered Josephson junction; Sub micrometer width; Wide junction effect; YBa 2Cu 3O 7 x

Indexed keywords

SUPERCONDUCTOR JUNCTIONS;

CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY); ELECTRIC POTENTIAL; HIGH TEMPERATURE SUPERCONDUCTORS; INTERFACES (MATERIALS); MAGNESIUM COMPOUNDS; PULSED LASER DEPOSITION; SAPPHIRE; SUBSTRATES; TEMPERATURE DISTRIBUTION;

JOSEPHSON JUNCTION DEVICES;

EID: 0035355030     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.947380     Document Type: Article

References (10)

1. RSFQ logic/memory family: A new Josephson junction technology for sub-terahertz-clock frequency digital systems
2. HTS mixers based on the Josephson effect and on the hot-electron bolometric effect
3. Physics and technology of high temperature superconducting Josephson junctions
4. c Josephson junctions
5. High-temperature superconducting edge-type Josephson junctions with modified interfaces
6. High-resistance HTS edge junctions for digital circuits
7. Preparation ramp-edge Josephson junctions with natural barriers
8. Inter-face-engineered Josephson junctions with high IcRn products
9. Stationary properties of high critical temperature proximity effect Josephson junctions