Growth of atomically flat homoepitaxial magnesium oxide thin films by metal-organic chemical vapor deposition

Materials Chemistry and Physics

Volumn 70, Issue 2, 2001, Pages 191-196

  Fan, W ^a   Markworth, P R ^a   Marks, T J ^a   Chang, R P H ^a  

^a NORTHWESTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LANGMUIR BLODGETT FILMS; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SUBSTRATES; THIN FILMS; VAPOR PHASE EPITAXY;

LANGMUIR PROBE;

MAGNESIA;

EID: 0035341795     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0254-0584(00)00502-2     Document Type: Article

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