ZnO:Zn phosphor thin films prepared by filtered arc deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 3, 2001, Pages 1004-1007

  Li, Wei ^a   Mao, Dongsheng ^a   Zhang, Fumin ^a   Wang, Xi ^a   Liu, Xianghuai ^a   Zou, Shichang ^a   Zhu, Yukun ^b   Li, Qiong ^b   Xu, Jingfang ^b  

^a SHANGHAI INSTITUTE OF MICROSYSTEM AND INFORMATION TECHNOLOGY   (China)

^b EAST CHINA NORMAL UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL MICROSTRUCTURE; DEPOSITION; FILM PREPARATION; PARTIAL PRESSURE; PHOSPHORS; PHOTOLUMINESCENCE; SPECTRUM ANALYSIS; THERMAL EFFECTS; X RAY DIFFRACTION ANALYSIS;

FILTERED ARC DEPOSITION (FAD);

THIN FILMS;

EID: 0035326382     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1371019     Document Type: Conference Paper

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