Determination and Control of Metallic Impurities in Alumina Deposits Obtained by Aqueous Electrophoretic Deposition

Journal of the American Ceramic Society

Volumn 84, Issue 4, 2001, Pages 733-739

  Ferrari, Begoña ^a   Fariñas, Juan Carlos ^a   Moreno, Rodrigo ^a  

^a INSTITUTO DE CERÁMICA Y VIDRIO   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; CURRENT DENSITY; ELECTRIC FIELD EFFECTS; ELECTRODEPOSITION; ELECTRODES; ELECTROPHORESIS; EMISSION SPECTROSCOPY; GALVANIZING; HYDROLYSIS; IMPURITIES; INDUCTIVELY COUPLED PLASMA;

ALUMINA DEPOSITS; ELECTROPHORETIC DEPOSITION; GALVANIC REACTIONS; METALLIC IMPURITIES; SLURRY PROPERTIES;

ALUMINA;

EID: 0035324323     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2001.tb00734.x     Document Type: Article

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