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Volumn 23, Issue 12, 2000, Pages 169-170,-172,-174,-176
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Characterizing a CVD-integrated metrology system
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
ELLIPSOMETRY;
MATHEMATICAL MODELS;
PERMITTIVITY;
PROCESS CONTROL;
REFLECTION;
REFLECTOMETERS;
REFRACTIVE INDEX;
SILICON NITRIDE;
SILICON WAFERS;
THICKNESS MEASUREMENT;
USER INTERFACES;
EMPIRICAL DISPERSION MODELS;
FRESNEL REFLECTIVITY COEFFICIENTS;
OPTICAL CONSTANTS;
OPTICAL FILM METROLOGY SYSTEM;
SILICON OXYNITRIDE;
OPTICAL INSTRUMENTS;
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EID: 0034300240
PISSN: 01633767
EISSN: None
Source Type: Journal
DOI: None Document Type: Article |
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Times cited : (1)
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References (0)
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