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Volumn 385, Issue 1-2, 2001, Pages 61-65
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Effect of implanted phosphorus on suicide formation in the Cr/Si(111) system
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Author keywords
Chromium; Ion implantation; Phosphorus; Suicides
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Indexed keywords
ANNEALING;
CHROMIUM;
DEPOSITION;
DIFFUSION IN SOLIDS;
EVAPORATION;
GROWTH (MATERIALS);
INTERFACES (MATERIALS);
PHOSPHORUS;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
SECONDARY ION MASS SPECTROMETRY;
SILICON;
SUBSTRATES;
CHROMIUM SILICIDE;
ELECTRON GUN EVAPORATION;
ION IMPLANTATION;
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EID: 0035311670
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(00)01864-2 Document Type: Article |
Times cited : (2)
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References (24)
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