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Volumn 385, Issue 1-2, 2001, Pages 61-65

Effect of implanted phosphorus on suicide formation in the Cr/Si(111) system

Author keywords

Chromium; Ion implantation; Phosphorus; Suicides

Indexed keywords

ANNEALING; CHROMIUM; DEPOSITION; DIFFUSION IN SOLIDS; EVAPORATION; GROWTH (MATERIALS); INTERFACES (MATERIALS); PHOSPHORUS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICON; SUBSTRATES;

EID: 0035311670     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01864-2     Document Type: Article
Times cited : (2)

References (24)
  • 21
    • 33645159866 scopus 로고
    • K. Maex, M.V. Rossen (Eds.), INSPEC Publication, Leuven, Belgium
    • R. Sinclair, in: K. Maex, M.V. Rossen (Eds.), Properties of Metal Suicides, INSPEC Publication, Leuven, Belgium, 1995, p. 118.
    • (1995) Properties of Metal Suicides , pp. 118
    • Sinclair, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.