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Volumn 385, Issue 1-2, 2001, Pages 174-181

Growth characteristics of multilayered physical vapour deposited TiN/TaNx on high speed steel substrate

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; EVAPORATION; FILM GROWTH; MAGNETRON SPUTTERING; MICROSTRUCTURE; PHYSICAL VAPOR DEPOSITION; STEEL; SUBSTRATES; TANTALUM COMPOUNDS; THIN FILMS; TITANIUM NITRIDE;

EID: 0035311558     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01880-0     Document Type: Article
Times cited : (45)

References (20)
  • 9
    • 33847584143 scopus 로고    scopus 로고
    • Ph.D. ThesisLinköping University, Sweden
    • P. Sandström, Ph.D. ThesisLinköping University, Sweden, 1999.
    • (1999)
    • Sandström, P.1
  • 19
    • 85031531949 scopus 로고
    • JCPDS, Swarthmore, PA
    • 2N): JCPDS, Swarthmore, PA, 1992.
    • (1992) 2N)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.