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Volumn 385, Issue 1-2, 2001, Pages 174-181
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Growth characteristics of multilayered physical vapour deposited TiN/TaNx on high speed steel substrate
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRON BEAMS;
EVAPORATION;
FILM GROWTH;
MAGNETRON SPUTTERING;
MICROSTRUCTURE;
PHYSICAL VAPOR DEPOSITION;
STEEL;
SUBSTRATES;
TANTALUM COMPOUNDS;
THIN FILMS;
TITANIUM NITRIDE;
ELECTRON BEAM EVAPORATION;
PSEUDOMORPHIC STABILIZATION;
MULTILAYERS;
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EID: 0035311558
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(00)01880-0 Document Type: Article |
Times cited : (45)
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References (20)
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