Surface morphology and quality of a-Si:C:H films

Thin Solid Films

Volumn 385, Issue 1-2, 2001, Pages 48-54

  Moskowitz, I L ^a   Babu, S V ^a  

^a CLARKSON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; HYDROGENATION; ION BOMBARDMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON CARBIDE; SURFACE ROUGHNESS; SURFACE STRUCTURE;

HYDROGENATED FILMS; SURFACE STRESS;

AMORPHOUS FILMS;

EID: 0035311374     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01886-1     Document Type: Article

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