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Volumn 21, Issue 4, 2001, Pages 471-475

Slow crack growth behavior in Si3N4 sintered with Yb2Si2O7 tie-line composition additives

Author keywords

Engine components; Grain boundaries; Si3N4; Sintering additives; Thermal properties

Indexed keywords

ALUMINUM COMPOUNDS; CRACK PROPAGATION; ELECTRIC RESISTANCE MEASUREMENT; GRANULAR MATERIALS; REFRACTORY MATERIALS; SILICON COMPOUNDS; STRESSES; YTTERBIUM COMPOUNDS;

EID: 0035309652     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0955-2219(00)00218-1     Document Type: Article
Times cited : (1)

References (23)
  • 19
    • 0005004304 scopus 로고
    • The structure of slow crack growth interfaces in silicon nitride
    • (1978) J. Mater. Sci , vol.13 , pp. 1455-1463
    • Tighe, N.J.1
  • 23


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.