Physical and optical characterisation of Ge-implanted silica

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 175-177, Issue , 2001, Pages 637-640

  Dowd, A ^a   Llewellyn, D ^a   Elliman, R G ^a   Luther Davies, B ^a   Samoc, M ^a   Fitz Gerald, J D ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

Four wave mixing; Ion implantation; Nanocrystals; Nonlinear optics; z scan

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; FOUR WAVE MIXING; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; NONLINEAR OPTICS; RAMAN SPECTROSCOPY; REFRACTIVE INDEX; RELAXATION PROCESSES; SEMICONDUCTING GERMANIUM; SILICA; TRANSMISSION ELECTRON MICROSCOPY;

DEGENERATIVE FOUR-WAVE MIXING;

SEMICONDUCTING GLASS;

EID: 0035302565     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(00)00536-X     Document Type: Conference Paper

References (14)