Surface images of SiO2/Si(100) pattern using electron emission microscopy with metastable atoms, photons and low-energy electrons

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 4 A, 2001, Pages 2447-2450

  Yasufuku, H ^a   Okumura, M ^a   Ibe, T ^a,b   Okudaira, K K ^a   Harada, Y ^b   Ueno, N ^a  

^a CHIBA UNIVERSITY   (Japan)

^b SEITOKU UNIVERSITY   (Japan)

Author keywords

Low energy electron emission microscopy; Metastable electron emission microscopy; Photoelectron emission microscopy; Si(100); SiO2; Surface electron state

Indexed keywords

ELECTRON EMISSION; ELECTRON ENERGY LEVELS; ELECTRON MICROSCOPY; IMAGE ANALYSIS;

LOW-ENERGY ELECTRON EMISSION MICROSCOPY (LEEM); METASTABLE ELECTRON EMISSION MICROSCOPY (MEEM);

SILICA;

EID: 0035301984     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.2447     Document Type: Article

References (13)