F atom adsorption on the fluorinated Si(001) surface

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 4 A, 2001, Pages 2115-2118

  Ezaki, Takahide ^a   Ohno, Takahisa ^a,b  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Adsorption; Density functional theory; Etching; Fluorine; Silicon; Surface

Indexed keywords

ADSORPTION; CHARGE TRANSFER; COMPUTER SIMULATION; ETCHING; FLUORINE; MONOLAYERS; PROBABILITY DENSITY FUNCTION; SEMICONDUCTING SILICON;

DENSITY FUNCTIONAL THEORY; FLUORINATION;

MOLECULAR DYNAMICS;

EID: 0035301677     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.2115     Document Type: Article

References (13)