Secondary electron yield of TiZr and TiZrV non-evaporable getter thin film coatings

Applied Surface Science

Volumn 172, Issue 1-2, 2001, Pages 95-102

  Henrist, B ^a   Hilleret, N ^a   Scheuerlein, C ^a   Taborelli, M ^a  

^a CERN   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AUGER ELECTRON SPECTROSCOPY; COMPOSITION EFFECTS; ELECTRON TRANSITIONS; GETTERS; LASER ABLATION; SPUTTER DEPOSITION; SUBSTRATES; SURFACE TREATMENT; THIN FILMS; TITANIUM ALLOYS; VACUUM APPLICATIONS;

SECONDARY ELECTRON YIELDS;

METALLIC FILMS;

EID: 0035282090     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00838-2     Document Type: Article

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