Unified analytic representation of physical sputtering yield

Journal of Nuclear Materials

Volumn 290-293, Issue , 2001, Pages 104-106

  Janev, R K ^a,c   Ralchenko, Yu V ^a,b   Kenmotsu, T ^b   Hosaka, K ^a  

^a GRADUATE UNIVERSITY FOR ADVANCED STUDIES   (Japan)

^b MACEDONIAN ACADEMY OF SCIENCES AND ARTS   (Macedonia)

^c WEIZMANN INSTITUTE OF SCIENCE   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

FUNCTIONS; ION IMPLANTATION;

PHYSICAL SPUTTERING YIELD;

SPUTTERING;

EID: 0035276243     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(00)00612-7     Document Type: Article

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