Silicon bonding for ultrahigh vaccuum surface science studies

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 2, 2001, Pages 706-708

  Gokhale, S ^a   Fink, A ^a   Trischberger, P ^a   Eberle, K ^a   Widdra, W ^a  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BONDING; DESORPTION; ETHANE; EVAPORATION; HYDROGEN; SILICON; SINGLE CRYSTALS; TEMPERATURE CONTROL; VACUUM APPLICATIONS;

SILICON BONDING; SURFACE SCIENCE; THERMAL DESORPTION;

SURFACE PROPERTIES;

EID: 0035271896     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1350997     Document Type: Article

References (8)