Pb(Mg1/3Nb2/3)0.97Ti0.03 O3 ferroelectric thin films, deposited by laser ablation on TiN bottom electrodes

Journal of Electroceramics

Volumn 6, Issue 1, 2001, Pages 21-25

  Fundora, A ^a,b   Martinez E ^a   Amorin H ^b,c   Contreras, O E ^a   Siqueiros, J M ^c  

^a CENTRO DE INVESTIGACIÓN CIENTÍFICA Y DE EDUCACIÓN SUPERIOR DE ENSENADA   (Mexico)

^b UNIVERSITY OF HAVANA   (Cuba)

^c CENTRO DE CIENCIAS DE LA MATERIA CONDENSADA   (Mexico)

Author keywords

Dielectric properties; Ferroelectric thin films; Microstructural properties

Indexed keywords

ANNEALING; CRYSTAL MICROSTRUCTURE; DEPOSITION; DIELECTRIC PROPERTIES OF SOLIDS; ELECTRODES; FATIGUE TESTING; HYSTERESIS; INTERFACES (MATERIALS); LASER ABLATION; LEAD COMPOUNDS; MORPHOLOGY; PHASE TRANSITIONS; POLYCRYSTALLINE MATERIALS; SCANNING ELECTRON MICROSCOPY; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

LEAD MAGNESIUM NIOBIUM TITANATE;

FERROELECTRIC THIN FILMS;

EID: 0035271244     PISSN: 13853449     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1011465502307     Document Type: Article

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