Doping-induced enhancement of grain boundary critical currents

IEEE Transactions on Applied Superconductivity

Volumn 11, Issue 1 III, 2001, Pages 2830-2837

  Hammerl, G ^a   Bielefeldt, H ^a   Goetz, B ^a   Schmehl, A ^a   Schneider, C W ^a   Schulz, R R ^a   Hilgenkamp, H ^a,b   Mannhart, J ^a  

^a UNIVERSITY OF AUGSBURG   (Germany)

^b UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Critical currents; Doping; Grain boundary; Josephson junctions

Indexed keywords

DIFFUSION; DOPING (ADDITIVES); ELECTRIC SPACE CHARGE; GRAIN BOUNDARIES; HETEROJUNCTIONS; HIGH TEMPERATURE SUPERCONDUCTORS; ION BEAM ASSISTED DEPOSITION; JOSEPHSON JUNCTION DEVICES; TEMPERATURE; YTTRIUM BARIUM COPPER OXIDES;

GRAIN BOUNDARY DIFFUSION; HIGH TEMPERATURE COATED CONDUCTORS; ROLLING ASSISTED BIAXIALLY ALIGNED SUBSTRATE PROCESS;

CRITICAL CURRENT DENSITY (SUPERCONDUCTIVITY);

EID: 0035269210     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.919652     Document Type: Conference Paper

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